US Patent Application No: 2009/0236,133

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Method of Manufacturing a Polymer and Poymer Material

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Abstract

In order to provide a method of manufacturing a polymer containing an extremely small amount of residual unreacted monomer component, and a material using the polymer, megasonic is directly radiated to a polymer containing a residual unreacted monomer under an atmosphere free of oxygen and moisture to thereby perfectly complete polymerization.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
OHMI, TADAHIROTOKYO220

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ohmi, Tadahiro Miyagi, JP 854 4833
Tanahashi, Naoki Miyagi, JP 29 92

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