Apparatus for Depositing Thin Films Over Large-Area Substrates
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United States of America Patent
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N/A
Issued Date -
Oct 8, 2009
app pub date -
Jul 30, 2007
filing date -
Aug 8, 2006
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
An apparatus for increasing uniformity of thin films deposited on a substrate includes multiple deposition sources to accommodate and discharge evaporation material. A member supports the deposition sources in a selected arrangement. A heater can be used to apply heat to the deposition sources. In another embodiment, the apparatus can include a container to accommodate evaporation material. The container may include aperture at or near its center. A cover caps an opening of the container and includes multiple gas outlets. The apparatus further includes a heater disposed along an inner surface of the aperture and along an outer surface of the container.
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