Method of depositing materials on a non-planar surface
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United States of America Patent
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Nov 12, 2013
Grant Date -
Oct 15, 2009
app pub date -
Jun 10, 2009
filing date -
Apr 5, 2007
priority date (Note) -
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Abstract
A method of depositing materials on a non-planar surface is disclosed. The method is effectuated by rotating non-planar substrates as they travel down a translational path of a processing chamber. As the non-planar substrates simultaneously rotate and translate down a processing chamber, the rotation exposes the whole or any desired portion of the surface area of the non-planar substrates to the deposition process, allowing for uniform deposition as desired. Alternatively, any predetermined pattern is able to be exposed on the surface of the non-planar substrates. Such a method effectuates manufacture of non-planar semiconductor devices, including, but not limited to, non-planar light emitting diodes, non-planar photovoltaic cells, and the like.
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