Section image acquiring method using combined charge particle beam apparatus and combined charge particle beam apparatus

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United States of America Patent

APP PUB NO 20090283677A1
SERIAL NO

12454253

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Abstract

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There is constructed a constitution of including a mark image taking step of taking a reference mark image by subjecting a region other than an observation object section to EB scanning, a drift amount calculating step of calculating a current SEM drift amount with regard to a predetermined time point by comparing the taken reference mark image with a reference mark reference image, and an offset amount calculating step of calculating an offset amount of a current observation object section with regard to the predetermined time point prior to a section image taking step and taking a section image by correcting an EB scanning region at the predetermined time point based on the SEM drift amount and the offset amount at the section image taking step.

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Patent Owner(s)

Patent OwnerAddress
SII NANOTECHNOLOGY INCCHIBA COUNTY CHIBA JAPAN CHIBA-SHI CHIBA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
IKKU, Yutaka Chiba-shi , JP 22 223

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