EXPOSURE MASK USING GRAY-TONE PATTERN, MANUFACTURING METHOD OF TFT SUBSTRATE USING THE SAME AND LIQUID CRYSTAL DISPLAY DEVICE HAVING THE TFT SUBSTRATE
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
N/A
app pub date -
May 20, 2009
filing date -
May 20, 2008
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Disclosed are an exposure mask capable of improving uniformity of a resist film thickness of a half film thickness part and reducing a display defect to increase a manufacturing yield, a method of manufacturing a TFT substrate using the exposure mask and a liquid crystal display comprising the TFT substrate manufactured by the method and having no display defect. The exposure mask includes a light-shielding pattern on a transparent substrate in which a gray-tone area is provided to at least a part of the light-shielding pattern, the gray-tone area having an oblong light-shielding pattern having a width of a submarginal resolution of an exposure apparatus and sandwiched between oblong slit-type transmissive patterns having a width of the submarginal resolution, and a light-shielding rate of the gray-tone area is gradually reduced toward a center of the oblong light-shielding pattern from longitudinal ends thereof.
First Claim
Family
International Classification(s)
- [Classification Symbol]
- [Patents Count]
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully