Method for manufacturing Chalcogenide devices
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United States of America Patent
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Issued Date -
Dec 3, 2009
app pub date -
May 28, 2008
filing date -
May 28, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A method of chalcogenide device formation includes treatment of the surface upon which the chalcogenide material is deposited. The treatment reduces or eliminates native oxides and other contaminants from the surface, thereby increasing the adhesion of the chalcogenide layer to the treated surface, eliminating voids between the chalcogenide layer and deposition surface and reducing the degradation of chalcogenide material due to the migration of contaminants into the chalcogenide.
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