CHARGED PARTICLE BEAM APPARATUS
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United States of America Patent
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Issued Date -
Dec 10, 2009
app pub date -
Aug 3, 2007
filing date -
Aug 23, 2006
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A charged particle beam apparatus is provided which can apply a charged particle beam onto a sample with aberration reduced and can apply a charged particle beam with no likelihood of occurrence of discharge even the case of introducing a gas into the sample surface.
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