Styrene butadiene styrene block copolymer based adhesive compositions with improved photo-oxidation resistance
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Dec 10, 2009
app pub date -
May 22, 2006
filing date -
May 30, 2005
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
The instant invention relates to styrene butadiene styrene based pressure sensitive adhesive compositions with improved photo-oxidation resistance containing N-methyl substituted sterically hindered amines as stabilizers. Further aspects of the invention are a process for the stabilization of butadiene based pressure sensitive adhesive compositions and the use of N-methyl substituted sterically hindered amines as stabilizers for styrene butadiene styrene based pressure sensitive adhesives.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully