Mask Dimensional Adjustment and Positioning System and Method
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United States of America Patent
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N/A
Issued Date -
Dec 17, 2009
app pub date -
Jun 12, 2009
filing date -
Jun 13, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
In a system and method of dimensional adjustment or positioning of an aperture mask for depositing a pattern of material on a substrate, an aperture mask is coupled to a frame such that the frame does not block one or more deposition apertures of the aperture mask. An external force applied to the frame causes the frame to move or bend and place the aperture mask in tension or compression thereby adjusting at least one dimension of the aperture mask or a position of at least one deposition aperture.
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