Control device and control method of plasma processing system, and storage medium storing control program
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United States of America Patent
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Nov 8, 2011
Grant Date -
Jan 14, 2010
app pub date -
Jul 1, 2009
filing date -
Jul 11, 2008
priority date (Note) -
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status (Latency Note)
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Abstract
In a control device of a plasma processing system, a storage unit is configured to store a reference recipe indicating an order of the plasma processing. An operation unit calculates a state variation value of each of the plasma processing devices by a predetermined timing at a plurality of processing lot intervals. A table generation unit generates an adjusting table for adjusting the reference recipe from the calculated state variation value of each of the plasma processing devices. In addition, a process executing control unit adjusts the reference recipe by using one of the generated adjusting tables for the plasma processing devices by the table generation unit and performs the plasma processing on the target object in the corresponding plasma processing device according to an order of the adjusted reference recipe.
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