Film deposition apparatus and method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 8440270
APP PUB NO 20100015359A1
SERIAL NO

12521179

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Abstract

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A film deposition apparatus which comprises: a processing chamber having a space inside which serves as a vacuum space to which a film deposition gas is supplied; a substrate supporting unit which is disposed in the vacuum space and supports a substrate; a coil which inductively heats the substrate supporting unit to thereby form a film from the film deposition gas on the substrate and which has been divided into regions; and a coil control unit which controls the coil region by region.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kobayashi, Hirokatsu Nirasaki, JP 11 41
Morisaki, Eisuke Shiroyama-Machi, JP 12 111
Yoshikawa, Jun Nirasaki, JP 131 3422

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