INSTRUMENTATION AND METHOD FOR MASKLESS PHOTOLITHOGRAPHY
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United States of America Patent
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Issued Date -
Jan 28, 2010
app pub date -
Nov 28, 2008
filing date -
Nov 29, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
There is disclosed a maskless photolithography apparatus and method where image patterns are determined by the user during visualization of a mounted material on a substrate with a microscope, and the image patterns are dynamically changed during visualization. The maskless photolithography system provides a means for dynamically generating a custom image pattern that depends on micron-scale landmarks in a mounted material without using a photomask.
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