Silicon dioxide dispersion

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United States of America Patent

PATENT NO 7888396
APP PUB NO 20100037800A1
SERIAL NO

12536150

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Abstract

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, which is obtained from a silicon dioxide powder produced by a flame hydrolysis process under acid conditions. The dispersion is produced by incorporating the silicon dioxide powder into an aqueous solution by means of a dispersing device. The dispersion can be used to produce glass articles.

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Patent Owner(s)

  • EVONIK DEGUSSA GMBH

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Oswald, Monika Hanau, DE 27 143
Schumacher, Kai Hofheim, DE 63 589

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