Polishing Composition and Polishing Method Using the Same
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United States of America Patent
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Issued Date -
Feb 18, 2010
app pub date -
Aug 13, 2008
filing date -
Aug 13, 2008
priority date (Note) -
Abandoned
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Abstract
A polishing composition for electrochemical mechanical polishing a surface of an object in which the polishing composition contains a phosphate electrolyte such as a potassium phosphate, a chelating agent such as a potassium citrate, a corrosion inhibitor such as benzotriazole, an oxidizing agent such as hydrogen peroxide, and a solvent such as water. The polishing composition preferably further contains abrasive particles such as colloidal silica particles.
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