PROCESS FOR DEPOSITING AN ELECTRICALLY CONDUCTIVE LAYER AND ASSEMBLY OF THE LAYER ON A POROUS SUPPORT SUBSTRATE
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United States of America Patent
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Jan 7, 2009
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Jul 7, 2006
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Abstract
A process for depositing an electrically conductive, preferably perovskitic layer uses a pulsed sputtering process. The layer has a low diffusivity for the elements in the iron group and is especially suitable for use in solid oxide fuel cells (SOFC). An assembly of the electrically conductive ceramic layer on a porous support substrate is also provided.
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