Epitaxy Processing System and Its Processing Method
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United States of America Patent
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Issued Date -
Mar 4, 2010
app pub date -
Aug 28, 2008
filing date -
Aug 28, 2008
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Abandoned
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Abstract
An epitaxy processing system and its processing method for enhancing operation efficiency is provided. The system includes a stacked cassette, a transportation device, a reaction chamber, and a cooling device. The cooling device can rapidly cool down susceptor and processed wafers without damaging the epitaxy layer. The cluster system design minimizes the footprint of system, reduces the operation cost, and increases throughput and thereby enhances the productivity of the system.
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