SEMICONDUCTOR POLISHING COMPOUND, PROCESS FOR ITS PRODUCTION AND POLISHING METHOD

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Nov 13, 2009
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Jul 22, 2002

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Further, the time for polishing a pattern wafer can be shortened by using this polishing compound.

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ASAHI GLASS COMPANY LIMITED	TOKYO 100-8405

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Inventor Name	Address	# of filed Patents	Total Citations
Ishida, Chie	Chigasaki-shi, JP	16	301
Kon, Yoshinori	Yokohoma-shi, JP	12	83
Nakazawa, Norihito	Yokohoma-shi, JP	12	294

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SEMICONDUCTOR POLISHING COMPOUND, PROCESS FOR ITS PRODUCTION AND POLISHING METHOD

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United States of America Patent

12618018

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12618018

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