HIGH-TEMPERATURE CLEANING SYSTEM, ASSOCIATED SUBSTRATES, AND ASSOCIATED METHODS
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United States of America Patent
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Issued Date -
Mar 4, 2010
app pub date -
Sep 4, 2008
filing date -
Sep 4, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A cleaning system adapted for cleaning a surface while maintaining the surface at a temperature up to the operating temperature of the surface is disclosed. The cleaning system includes a cleaning composition and a substrate. The cleaning composition is adapted to withstand a temperature up to the operating temperature of the surface. Also, the cleaning composition includes one or more solvents, one or more surfactants, and one or more alkalinity sources or one or more acidity sources. The substrate includes a material and is adapted to communicate the cleaning composition to the soiled surface. Also, the substrate is adapted to withstand a temperature up to the operating temperature of the surface and the cleaning composition at least during the communication of the cleaning composition.
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