PROXIMITY CORRECTION METHOD AND SYSTEM
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United States of America Patent
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Issued Date -
Mar 11, 2010
app pub date -
Sep 5, 2008
filing date -
Sep 5, 2008
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Abandoned
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Abstract
A proximity correction method includes creating a first proximity correction model having a focus value and creating a second proximity correction model having a first defocus value. One of the first or second proximity correction models are associated with corresponding first and second layout areas of a semiconductor wafer.
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