METHODS FOR ELECTRON-BEAM INDUCED DEPOSITION OF MATERIAL INSIDE ENERGETIC-BEAM MICROSCOPES
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United States of America Patent
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Issued Date -
Mar 18, 2010
app pub date -
Sep 16, 2008
filing date -
Sep 16, 2008
priority date (Note) -
Abandoned
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Abstract
We disclose method for materials deposition on a surface inside an energetic-beam instrument, where the energetic beam instrument is provided with a laser beam, an electron beam, and a source of precursor gas. The electron beam is focused on the surface, and the laser beam is focused to a focal point that is at a distance above the surface of about 5 microns to one mm, preferably from 5 to 50 microns. The focal point of the laser beam will thus be within the stream of precursor gas injected at the sample surface, so that the laser beam will facilitate reactions in this gas cloud with less heating of the surface. A second laser may be used for cleaning the surface.
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