CRYSTAL SILICON ELEMENT AND METHOD FOR FABRICATING SAME

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United States of America Patent

APP PUB NO 20100090230A1
SERIAL NO

11997399

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Abstract

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It is an object of the present invention to provide a crystal silicon element emitting a desired visible light at high efficiency, by markedly enhancing the crystallinity of the nano Si. A p-type single crystal silicon substrate 10, a thick silicon oxide film 17a and a thin silicon oxide film 17b are disposed on the one surface of the silicon substrate 10. On the thin silicon oxide film 17b, plural nano Si 15 having the same crystal axis as the silicon substrate 10 are formed. In addition, a thin silicon oxide film 16 that is disposed in a manner that the thin silicon film 16 covers the upper and side faces of the nano Si 15, and a transparent electrode (for example ITO) 19 that is disposed in a manner that the transparent electrode 19 covers at least the upper face of the nano Si 15 are formed. Further, a metal electrode 18 (for example, aluminum) is formed in a manner that the metal electrode 18 has an ohmic contact with the other surface of the silicon substrate 10.

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Patent Owner(s)

Patent OwnerAddress
HITACHI MAXELL LTDOSAKA JAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honma, Hideo Osaka, JP 31 468

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