Method and Apparatus for Reacting Thin Films on Low-Temperature Substrates at High Speeds
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United States of America Patent
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Issued Date -
Apr 22, 2010
app pub date -
Oct 19, 2009
filing date -
Oct 17, 2008
priority date (Note) -
Abandoned
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Abstract
A method for reacting thin films on a low-temperature substrate within a reactive atmosphere is disclosed. The thin film contains a reducible metal oxide, and the reactive atmosphere contains a reducing gas such as hydrogen or methane. The low-temperature substrate can be polymer, plastic or paper. Multiple light pulses from a high-intensity strobe system are used to reduce the metal oxide to metal and to sinter the metal if applicable.
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