Method for Structuring a Layered Stack
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United States of America Patent
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Issued Date -
Apr 22, 2010
app pub date -
Oct 16, 2008
filing date -
Oct 16, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
One implementation is a method for fabricating a semiconductor on a substrate. A first layer is formed on the substrate. An implanted pattern is introduced into the first layer by implanting using a structured implantation mask arranged over the first layer. A structured second layer is formed on the first layer after removing the implantation mask. A first pattern is generated in the substrate using the second layer as a mask. The first layer is developed with regard to the implanted pattern. A second pattern is generated in the substrate using the first layer as a mask.
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