METHOD OF FABRICATING TRANSPARENT CONDUCTIVE FILM
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United States of America Patent
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Issued Date -
Apr 29, 2010
app pub date -
Oct 29, 2008
filing date -
Oct 29, 2008
priority date (Note) -
Abandoned
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Abstract
A method of fabricating transparent conductive film including the following steps is provided. First, a reactive chamber having at least a target and at least a heating device is provided. Subsequentially, a plasma is generated in the reactive chamber, wherein the plasma is located above the target. Next, the plasma is heated by the heating device from a standby temperature to a working temperature. Simultaneously, a hard plastic substrate is passed above the plasma at a specific speed, wherein the particles of the target are bombarded by the plasma so as to form transparent conductive film on the hard plastic substrate.
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