WATER-DEVELOPABLE PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL

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United States of America Patent

APP PUB NO 20100112478A1
SERIAL NO

12532592

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Abstract

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The present invention provides a highly sensitive photosensitive lithographic printing plate material capable of being used in a CTP system, which allows on-press development and/or development with water and has superior printability. More specifically, the present invention provides a water-developable photosensitive lithographic printing plate material comprising a support; on the support, a hydrophilic layer containing a water-soluble polymer, a crosslinking agent which forms a cross-linking network with the water-soluble polymers, and colloidal silica, wherein the weight ratio of the water-soluble polymer to the colloidal silica is within the range of 1:1 to 1:3; and, on the hydrophilic layer, a photocurable photosensitive layer containing a polymer having a sulfonic acid group and a vinylphenyl group in a side chain wherein the vinylphenyl group is attached to a main chain through a linking group containing a hetero ring, a photopolymerization initiator, and a compound which sensitizes the photopolymerization initiator.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI PAPER MILLS LIMITED10-14 RYOGOKU 2-CHOME SUMIDA-KU TOKYO 130-0026

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Furukawa, Akira Tokyo, JP 121 571

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