High resolution flexural stage for in-plane position and out-of-plane pitch/roll alignment

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United States of America Patent

PATENT NO 8390233
APP PUB NO 20100116161A1
SERIAL NO

12628365

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An adjustment structure used in conjunction with an imprinting structure is provided. The adjustment structure includes a sample mount for mounting a sample. An actuator mechanism is coupled to the sample mount, the actuator mechanism producing actuated forces on a X-Y plane to produce movements on a sample mount. A plurality of bladed flexures are positioned on the sample mount. The bladed flexures controls the movements of the sample mount produced by the actuator mechanism so as to allow adjustments in angular alignment about the pitch-roll (θXY) rotation axes or the X-Y plane relative to the sample mount so the imprinting structure can perform its operations on the sample.

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Patent Owner(s)

Patent OwnerAddress
MASSACHUSETTS INSTITUTE OF TECHNOLOGY77 MASSACHUSETTS AVENUE CAMBRIDGE MA 02139

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shilpiekandula, Vijay Cambridge, US 13 183
Youcef-Toumi, Kamal Cambridge, US 43 508

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