REACTION CHAMBER
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United States of America Patent
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Issued Date -
May 13, 2010
app pub date -
Nov 5, 2009
filing date -
Nov 7, 2008
priority date (Note) -
Abandoned
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Abstract
A reaction chamber having a reaction spaced defined therein, wherein the reaction space is tunable to produce substantially stable and laminar flow of gases through the reaction space. The substantially stable and laminar flow is configured to improve the uniformity of deposition on substrates being processed within the reaction chamber to provide a predictable deposition profile.
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