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United States of America Patent

APP PUB NO 20100163740A1
SERIAL NO

12665485

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A semiconductor substrate is composed of a SiC crystal. A metal film having a desired area and serving as an incident surface onto which X-rays are made incident is formed on one surface of the semiconductor substrate. An electrode having the shape of a circle is formed at the central portion of the other surface of the semiconductor substrate. A ring-shaped electrode is formed in a portion near the circumference of the semiconductor substrate so as to surround the electrode. A predetermined direct voltage is applied to the metal film and the ring-shaped electrode. A voltage of a ground level is applied to the electrode. X-rays (γ-rays) that are made incident onto the metal film cause the generation of electron-hole pairs in the semiconductor substrate. The generated electrons are collected at the electrode and drawn as electric signals from an output terminal.

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Patent Owner(s)

Patent OwnerAddress
OSAKA ELECTRO-COMMUNICATION UNIVERSITY18-8 HATSU-CHO NEYAGAWA-SHI OSAKA 572-8530

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Matsuura, Hideharu Osaka, JP 3 23

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