METHOD FOR REGENERATING A SURFACE OF AN OPTICAL ELEMENT IN AN XUV RADIATION SOURCE, AND XUV RADIATION SOURCE
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United States of America Patent
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Issued Date -
Jul 8, 2010
app pub date -
Oct 11, 2007
filing date -
Oct 13, 2006
priority date (Note) -
Abandoned
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Abstract
Method for regenerating a surface of an optical element in a radiation source for electromagnetic radiation with a wavelength in the extreme ultraviolet wavelength range, H (EUV, XUV) in particular with a wavelength in the wavelength range between 10 nm and 15 nm, this radiation source comprising at least a chamber for arranging therein a plasma generating XUV or EUV radiation and the optical element, in particular a collector for bundling XUV or EUV radiation generated by the plasma and causing it to exit the chamber, according to which method a first Si, C or metal compound is arranged in the chamber which reacts in an equilibrium reaction with the material of the surface of the collector to form respectively a second Si, C or metal compound bonded to this surface, and XUV or EUV radiation source adapted for such a method.
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