Gas processing apparatus, gas processing system, and gas processing method, and exhaust gas processing system and internal combustion engine using the same
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United States of America Patent
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Feb 5, 2013
Grant Date -
Aug 12, 2010
app pub date -
Jul 12, 2008
filing date -
Jul 12, 2007
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Abstract
A gas processing apparatus for processing a gas using plasma is highly versatile and capable of rapidly processing a large quantity of gas that includes particularly an aromatic compound or other component that is difficult to process. The gas processing apparatus comprises a plasma equipment series comprising a plurality of gas processing units arranged in series on a gas flow channel; and a control section for controlling the operation of each unit of plasma equipment of the plasma equipment series. Each of the units of plasma equipment comprises a cavity composed of an electrical conductor and communicated with the gas flow channel; a plasma generator for generating plasma within the cavity; and microwave radiator for radiating microwaves to the plasma generated by the plasma starting section. The control section selects the number of units of plasma equipment to operate according to a component of the introduced gas.
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