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Abstract

We disclose a method of electron-beam induced of etching the surface of a specimen in a charged-particle beam instrument, where the charged-particle beam instrument has first and second laser beams, an electron beam, and a gas-injection system for applying etchant gas to the surface. Etching is accomplished by applying a photolytic pulse from the first laser to the surface; applying a pyrolytic pulse from the second laser to the surface; and, applying an etchant gas to the surface at least during the pyrolytic pulse. Two or more alternating pyrolytic laser pulses and photolytic laser pulses may be applied to the surface. The stage supporting the specimen may be tilted relative to the axis of the electron beam before applying the electron beam to the surface of the specimen. The electron beam is applied to the surface of the specimen during the time the etchant gas is present at the surface.

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First Claim