MEMS devices having support structures with substantially vertical sidewalls and methods for fabricating the same
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United States of America Patent
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-
Oct 30, 2012
Grant Date -
Aug 12, 2010
app pub date -
Apr 23, 2010
filing date -
Aug 19, 2005
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Embodiments of MEMS devices include support structures having substantially vertical sidewalls. Certain support structures are formed through deposition of self-planarizing materials or via a plating process. Other support structures are formed via a spacer etch. Other MEMS devices include support structures at least partially underlying a movable layer, where the portions of the support structures underlying the movable layer include a convex sidewall. In further embodiments, a portion of the support structure extends through an aperture in the movable layer and over at least a portion of the movable layer.
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