High accuracy vapor generation and delivery for thin film deposition
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United States of America Patent
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app pub date -
Apr 19, 2010
filing date -
Dec 30, 2004
priority date (Note) -
Abandoned
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Abstract
The present invention involves injecting a liquid and gas into a vapor holding chamber held at a sufficiently high temperature to insure all the liquid injected is vaporized and held in the chamber as a vapor. The gas/vapor mixture is then delivered to the deposition chamber in which the deposition substrate is held.
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