Pattern generator
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United States of America Patent
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Jun 7, 2011
Grant Date -
Aug 19, 2010
app pub date -
Apr 28, 2010
filing date -
Mar 2, 1998
priority date (Note) -
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status (Latency Note)
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Abstract
The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.
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