ITO layer manufacturing process & application structure
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United States of America Patent
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Issued Date -
Aug 26, 2010
app pub date -
Oct 30, 2007
filing date -
Oct 30, 2007
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A two-stage manufacturing process for preparation of an ITO layer includes having first a transparent substrate, e.g., a glass or plastic substrate going through treatment without preheating; the substrate is then sputtering processed in a sputtering chamber under process conditions without heating up to form a amorphous state ITO film on the surface of the transparent substrate; followed with a thermal treatment at a preset temperature to turn the ITO layer into a crystalline state without compromising strength of the glass or the plastic substrate while delivering a durable ITO layer and a structure of ITO layer provided with a specific sheet resistance and/or thickness. The ITO layer produced using the present invention particularly fits to be applied in a touch screen structure.
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