SUBSTRATE PREPARATION FOR ENHANCED THIN FILM FABRICATION FROM GROUP IV SEMICONDUCTOR NANOPARTICLES
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United States of America Patent
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Issued Date -
Aug 26, 2010
app pub date -
Feb 29, 2008
filing date -
Feb 20, 2007
priority date (Note) -
Abandoned
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Abstract
A method for producing a thin film promoter layer is disclosed. The method includes depositing a Group IV semiconductor ink on a substrate, the Group IV semiconductor ink including a set of Group IV semiconductor nanoparticles and a set of metal nanoparticles to form a porous compact. The method also includes heating the substrate to a first temperature between about 350° C. to about 765° C. and for a first time period between 5 min to about 3 hours.
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