Lithography apparatus and lithography method

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United States of America Patent

PATENT NO 8653477
APP PUB NO 20100238420A1
SERIAL NO

12706049

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A lithography apparatus includes a stage on which a target object is placed; a chamber in which the stage is arranged and which has one side surface in which an opening having a size which is enough to carry the stage in or out is formed, the opening being closed with an independent lid; an electro-optic lens barrel arranged on the chamber; and a rib portion formed to have a shape that is convex on an upper portion of the side surface of the chamber in which the opening is formed.

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Patent Owner(s)

  • NUFLARE TECHNOLOGY, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Saito, Hiroyasu Shizuoka, JP 10 27

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