Method of treating a semiconductor substrate
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United States of America Patent
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Jul 26, 2011
Grant Date -
Sep 23, 2010
app pub date -
May 26, 2010
filing date -
Jun 16, 2008
priority date (Note) -
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Abstract
A method of treating a semiconductor substrate has forming convex patterns over the semiconductor substrate by dry etching, cleaning and modifying a surface of the convex patterns by using chemical, forming a hydrophobic functional surface on the modified surface of the convex patterns, after forming the hydrophobic functional surface, rinsing the semiconductor substrate by using water, drying the semiconductor substrate, and removing the hydrophobic functional group from the hydrophobic functional surface of the convex patterns.
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