Cell Structure With High Aspect Ratio Gridlines

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United States of America Patent

SERIAL NO

12818760

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Abstract

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A cell structure (e.g., a battery or solar cell) is formed by extruding/dispensing materials on a substrate such that centrally disposed conductive high aspect ratio line structures (gridlines) are formed on the substrate surface such that each gridline has an aspect ratio greater than 2:1. Each gridline is formed with localized support structures coincidentally disposed on opposing side surfaces of the gridlines such that the gridlines are surrounded or otherwise supported by the localized support structures. The localized support structures are sacrificial in the sense that they are removed as part of the solar cell structure manufacturing process (e.g., after subsequent processing hardens the gridline material). In one embodiment each gridline has a width in the range of 100 nanometers to 100 microns. The co-extrusion process is performed such that both the central gridline and the localized support structures are in direct contact with the surface of the substrate.

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Patent Owner(s)

Patent OwnerAddress
SOLARWORLD INNOVATIONS GMBHBERTHELSDORFER STR 111A FREIBERG 09599

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fork, David K Mountain View, US 160 3849
Hantschel, Thomas Menlo Park, US 68 851

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