METHOD AND APPARATUS FOR GROWING A THIN FILM ONTO A SUBSTRATE
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United States of America Patent
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Issued Date -
Oct 21, 2010
app pub date -
Apr 21, 2009
filing date -
Apr 21, 2009
priority date (Note) -
Abandoned
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Abstract
An apparatus and method of growing a thin film onto a substrate comprises placing a substrate in a reaction chamber and subjecting the substrate to surface reactions of a plurality of vapor-phase reactants according to the ALD method. Non-fully closing valves are placed into the reactant feed conduit and backsuction conduit of an ALD system. The non-fully closed valves are operated such that one valve is open and the other valve is closed during the purge or pulse cycle of the ALD process.
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