FILM FORMATION REACTIVE APPARATUS AND METHOD FOR PRODUCING FILM-FORMED SUBSTRATE

United States of America Patent

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Issued Date
Oct 28, 2010
app pub date
Apr 1, 2010
filing date
Apr 23, 2009

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Abandoned

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Abstract

in such a manner that a change in the respective gas flow rates of the partial control zones causes the deviation at a variety of the locations to be reduced.

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Patent Owner(s)

Patent Owner	Address
SUMCO TECHXIV CORPORATION	OMURA-SHI NAGASAKI 856-8555

International Classification(s)

C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
KOBAYASHI, Hidenori	Omura-shi, JP	53	562
NAKAMURA, Motonori	Omura-shi, Nagasaki, JP	56	882
NISHIKIDO, Kouichi	Omura-shi, Nagasaki, JP	3	320

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FILM FORMATION REACTIVE APPARATUS AND METHOD FOR PRODUCING FILM-FORMED SUBSTRATE

Number of patents in Portfolio can not be more than 2000

United States of America Patent

12752383

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12752383

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