Programmable resistance memory and method of making same

United States of America Patent

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Issued Date
Nov 11, 2010
app pub date
May 11, 2009
filing date
May 11, 2009

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Abandoned

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Abstract

A memory includes multiple layers of deposited memory material. An etch is performed on at least one layer of deposited memory material prior to the deposition of a subsequent layer of memory material.

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Patent Owner	Address
OVONYX INC	2956 WATERVIEW DRIVE ROCHESTER HILLS MI 48309

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor Name	Address	# of filed Patents	Total Citations
Czubatyj, Wolodymyr	Warren, US	67	5770
Dennison, Charles	San Jose, US	43	2659
Fournier, Jeff	Livonia, US	5	75
Latowski, Tom	Macomb, US	1	9
Reed, James	Auburn Hills, US	39	390
Sandoval, Regino	Rochester Hills, US	11	231

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Programmable resistance memory and method of making same

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United States of America Patent

12454002

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12454002

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