Importance

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Abstract

The present invention discloses structural improvement of the vertical submerged pump for chemical application. The present invention is focus on reducing the crystal lump generated from high speed etching process. Structural improvement includes a shaft seal device, a diffuser and an upper inner plate. The shaft seal device offer extra flow resistance to balance the differential pressure between the inner space and pump front casing, the function are prevents air bubbles be sucked into the pump, and reduces flow leakage from the front casing into inner space, also absorbs high-pressure back-flush to avoid liquid splash in dry surface of inner space of support column. The diffuser in the support column offer extra inducer function to guides the liquid from the inner space flowing out to the tank, so as to get a stable liquid level in the inner space, thereby largely reducing splashing of the liquid. And the upper inner plate blocks the residual small amount drops from liquid splashing, to minimize producing of crystals lump from high speed etching liquid.

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First Claim