Controlling electromechanical behavior of structures within a microelectromechanical systems device

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United States of America Patent

PATENT NO 8278726
APP PUB NO 20100320555A1
SERIAL NO

12861778

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Abstract

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In one embodiment, the invention provides a method for fabricating a microelectromechanical systems device. The method comprises fabricating a first layer comprising a film having a characteristic electromechanical response, and a characteristic optical response, wherein the characteristic optical response is desirable and the characteristic electromechanical response is undesirable; and modifying the characteristic electromechanical response of the first layer by at least reducing charge build up thereon during activation of the microelectromechanical systems device.

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Patent Owner(s)

  • SNAPTRACK, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Batey, John San Jose, US 21 1016
Chui, Clarence San Jose, US 259 8755
Kothari, Manish San Jose, US 215 7360
Miles, Mark W Atlanta, US 140 17368
Tung, Ming-Hau San Jose, US 78 2829

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