METHOD AND APPARATUS FOR DEPOSITION OF A LAYER OF AN INDIUM CHALCOGENIDE ONTO A SUBSTRATE
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United States of America Patent
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Issued Date -
Jan 27, 2011
app pub date -
Jul 26, 2010
filing date -
Jul 24, 2009
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Abandoned
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Abstract
A method deposits a layer of an indium chalcogenide onto a substrate. The method includes the steps of: providing an indium source in a reaction zone, providing a gaseous source of a chalcogen in the reaction zone, and heating the substrate. Thereby in the reaction zone, at a pressure of approximately atmospheric ambient pressure, the indium originating from the indium source and the chalcogen originating from the source of a chalcogen are converted to an indium chalcogenide being deposited onto the surface of the substrate.
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