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Abstract

Improved protective metallization arrangements are described that are particularly useful in bumped copper-top type semiconductor chips. In one aspect of the invention, the semiconductor device includes integrated circuits and has a top wafer fabrication passivation layer. A plurality of I/O pads are exposed through contact pad openings formed in the top wafer fabrication passivation layer. A patterned copper layer is formed over the top wafer fabrication passivation layer. The patterned copper layer is electrically coupled to the contact pads through the contact pad openings. A metallic barrier layer is provided between the contact pads and the patterned copper layer. A titanium metallization layer overlies at least portions of the patterned copper layer and preferably cooperates with the barrier layer to envelop the copper layer in the regions of the contact pads. A first aluminum metallization layer overlies at least portions of the titanium metallization layer. An electrically insulating protective layer overlies the first aluminum metallization layer and the top wafer fabrication passivation layer. The protective layer is preferably formed from an organic material and includes a plurality of contact openings. Underbump metallization stacks are formed in the contact openings. Each underbump metallization stack is electrically connected to the first aluminum metallization layer through its associated contact opening in the protective layer. Solder bumps are preferably then adhered to the underbump metallization stacks.

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First Claim