DEPOSITION APPARATUS FOR TEMPERATURE SENSITIVE MATERIALS

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United States of America Patent

SERIAL NO

12909655

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Abstract

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A system for the deposition of vaporized materials on a substrate is described, comprising at least first and second orientation-independent apparatuses for directing vaporized organic materials onto a substrate surface to form first and second films, each of the first and second orientation-independent apparatuses being arranged in a different relative orientation and comprising: a chamber containing a quantity of material; a permeable member at one end of the chamber with a heating element for vaporizing the material; and means for continuously feeding the material toward the permeable member as it is vaporized, whereby organic material vaporizes at a desired rate-dependent vaporization temperature at the one end of the chamber. A plurality of thin films may be deposited on a substrate using deposition apparatus in a variety of orientations. Such a design provides reduced costs and improved deposition rate control.

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Patent Owner(s)

Patent OwnerAddress
GLOBAL OLED TECHNOLOGY LLCHERNDON VA 20171

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cok, Ronald S Rochester, US 674 23210
Long, Michael Hilton, US 115 1540

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