Photo-patternable dielectric materials and formulations and methods of use

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Apr 30, 2013
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Mar 3, 2011
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Aug 31, 2009
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Aug 31, 2009

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Abstract

Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.

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GLOBALFOUNDRIES INC	GRAND CAYMAN CAYMAN ISLANDS

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C08G:MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN B....

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Inventor Name	Address	# of filed Patents	Total Citations
Allen, Robert David	San Jose, US	73	809
Brock, Phillip Joe	San Jose, US	31	632
Davis, Blake W	San Jose, US	14	242
Lin, Qinghuang	Yorktown Heights, US	152	2344
Miller, Robert Dennis	San Jose, US	97	2092
Nelson, Alshakim	San Jose, US	55	648
Sooriyakumaran, Ratnam	San Jose, US	126	2309

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Photo-patternable dielectric materials and formulations and methods of use

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United States of America Patent

12550683

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PATENT NO	8431670
APP PUB NO	20110048787A1
SERIAL NO	12550683
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
April 30, 2013	US,8431670,B2 US8431670B2	GRANTED PATENT AS SECOND PUBLICATION
March 03, 2011	US,20110048787,A1 US20110048787A1	FIRST PUBLISHED PATENT APPLICATION

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12550683

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