Positive Type Photosensitive Composition

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United States of America Patent

APP PUB NO 20110053081A1
SERIAL NO

12649893

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Abstract

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Disclosed is a positive typed photosensitive composition including a polyamide derivative being represented by

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Patent Owner(s)

Patent OwnerAddress
KOREA KUMHO PETROCHEMICAL CO LTDKUMHO ASIANA MAIN TOWER 115 SINMUNNO 1-GA JONGNO-GU SEOUL 110-857

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Jung Hwan Seoul, KR 34 434
Lee, Joung Bum Seoul, KR 3 2
Park, Joo Hyeon Seoul, KR 16 64
Son, Kyung Chul Seoul, KR 3 0

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