SYSTEM FOR ANALYSING PLASMA
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United States of America Patent
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Issued Date -
Mar 10, 2011
app pub date -
May 7, 2009
filing date -
May 7, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
A system for analysing plasma. The system comprises at least one sensor which is co-operable with a plasma source for providing an analog signal representative of a characteristic of plasma from the plasma source, and a sound card installed on a computing means in communication with the sensor for converting the analog signal into a digital signal for facilitating digital processing thereof.
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